A major percentage of today's industrial coating processes are performed with the aid of sputter technology. In this connection, it is important to analyze the composition of the gas with the inlet system having little or no influence. The special ion sources in the sputter process monitors are designed for this purpose. The HPA is an especially flexible system. Thanks to the options for combining it with various gas inlets, the widest possible range of applications can be implemented.

• Sputter Process Monitor SPM 200
• Sputter Process Monitor SPM 400

• High Pressure Analyzer HPA 200

Applications

• Mass ranges: 1-100 amu, 1-200 amu, 1-300 amu, 1-512 amu
• Online monitoring of sputter-coating and reactive processes
• Gas analysis in sputter processes
• HPA can be combined with numerous inlet systems
• Quality assurance through on-site monitoring of vacuum conditions and process gases
• Applications in the pressure range of up to 10 mbar

Customer value

• For maximum process yields and optimum product quality
• Ready-to-install systems, easily integratable into the process
• Direct gas inlet to the ion source, without falsification
• Highest sensitivity
• Lowest detection limits
• Cost-effective, compact solutions
• Highest sensitivity, lowest detection limit, fast measuring speed
• Quantitative results, data output in ppm or %