Compact, robust dry pumps with a pumping speed of 84 m³/h. Especially suitable for use in semiconductor technology, for laboratory applications and in the coating industry.

• OnTool DryPump P
• OnTool DryPump L

• Accessories OnTool DryPump

Applications

• Physical vapor deposition (PVD)
• Chemical vapor deposition (CVD)
• Etching
• EUV lithography
• Plasma coating
• Thermal evaporation
• Laboratory applications
• Vacuum funaces
• Load-locks
• Solar cell coating

Customer value

• Compact, multi-stage dry pump
• Significant initial cost savings through installation directly to the system
• High process throughputs, low leakage rates
• Reduced contamination due to soft pumping capability
• No fore-vacuum lines (heated) required
• High level of reliability due to contactless, wear-free seal

Note

• P = Process version, pump-down of corrosive and condensing media
• L = Light version, pump-down of load-locks and clean applications